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Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition
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SYSNO 0341570 Title Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition Author(s) Červenka, Jiří (FZU-D) RID, ORCID
Ledinský, Martin (FZU-D) RID, ORCID, SAI
Stuchlíková, The-Ha (FZU-D) RID, ORCID
Stuchlík, Jiří (FZU-D) RID, ORCID
Výborný, Zdeněk (FZU-D)
Holovský, Jakub (FZU-D) RID, ORCID
Hruška, Karel (FZU-D) RID, ORCID
Fejfar, Antonín (FZU-D) RID, ORCID, SAI
Kočka, Jan (FZU-D) RID, ORCID, SAISource Title Physica Status Solidi : Rapid Research Letters. Roč. 4, 1-2 (2010), s. 37-39. - : Wiley Document Type Článek v odborném periodiku Grant LC06040 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z10100521 - FZU-D (2005-2011) Language eng Country DE Keywords nanowires * silicon * scanning electron microscopy * hemical vapor deposition * Raman spectroscopy URL http://www3.interscience.wiley.com/cgi-bin/fulltext/123213957/HTMLSTART Permanent Link http://hdl.handle.net/11104/0184509
Number of the records: 1