LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition

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SYSNO	0336628
Title	LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition
Author(s)	Stuchlík, Jiří (FZU-D)_{RID, ORCID} Ledinský, Martin (FZU-D)_{RID, ORCID, SAI} Honda, Shinya (FZU-D) Drbohlav, Ivo (FZU-D)_{RID, ORCID} Mates, Tomáš (FZU-D)_{RID, ORCID} Fejfar, Antonín (FZU-D)_{RID, ORCID, SAI} Hruška, Karel (FZU-D)_{RID, ORCID} Stuchlíková, The-Ha (FZU-D)_{RID, ORCID} Kočka, Jan (FZU-D)_{RID, ORCID, SAI}
Source Title	Thin Solid Films. Roč. 517, č. 24 (2009), s. 6829-6832. - : Elsevier
Document Type	Článek v odborném periodiku
Grant	KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	GD202/05/H003 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	IAA1010413 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
CEZ	AV0Z10100521 - FZU-D (2005-2011)
Language	eng
Country	CH
Keywords	amorphous hydrogenated silicon * atomic force microscopy * plasma-enhanced chemical vapour deposition, * nucleation * Raman scattering * lithium fluoride
Permanent Link	http://hdl.handle.net/11104/0180823

Number of the records: 1