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Influence of process parameters on the properties of TEOS DF-PECVD grown SiO2 films by DOE
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SYSNO 0335271 Title Influence of process parameters on the properties of TEOS DF-PECVD grown SiO2 films by DOE Author(s) Mikmeková, Eliška (UPT-D) RID
Janča, J. (CZ)
Dvořáková, M. (CZ)Source Title MC 2009 - Microscopy Conference: First Joint Meeting of Dreiländertagung and Multinational Conference on Microscopy. Vol. 3: 463-464. - Graz : Verlag der Technischen Universität, 2009 Conference MC 2009 - Joint Meeting of Dreiländertagung and Multinational Congress on Microscopy /9./, Graz, 30.08.2009-04.09.2009 Document Type Konferenční příspěvek (zahraniční konf.) CEZ AV0Z20650511 - UPT-D (2005-2011) Language eng Country AT Keywords DF-PECVD * silicon dioxide * intrinsic stress * DOE * SEM URL http://www.univie.ac.at/asem/Graz_MC_09/papers/65557.pdf Permanent Link http://hdl.handle.net/11104/0179780
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