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Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

  1. 1.
    SYSNO0335019
    TitleComparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems
    TitlePorovnávací studie celkové výkonové hustoty na substrát v pulzním DC magnetronovém výboji a v plazma-jetu s dutou katodou
    Author(s) Čada, Martin (FZU-D) RID, ORCID, SAI
    Virostko, Petr (FZU-D)
    Kment, Štěpán (FZU-D) RID, ORCID
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Source Title Plasma Processes and Polymers. Roč. 6, S1 (2009), S247-S252. - : Wiley
    Conference International Conference on Plasma Surface Engineering /11./, Garmisch Partenkirchen, 15.09.2008-19.09.2008
    Document TypeČlánek v odborném periodiku
    Grant KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KJB100100707 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    CEZAV0Z10100522 - FZU-D (2005-2011)
    Languageeng
    CountryDE
    Keywords calorimeter probe * floating substrate * magnetron * plasma jet * pulsed discharge
    Permanent Linkhttp://hdl.handle.net/11104/0179607
     
Number of the records: 1  

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