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Deposition of SiC thin films using pulsed sputtering of a hollow cathode
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SYSNO 0331189 Title Deposition of SiC thin films using pulsed sputtering of a hollow cathode Title Depozice SiC tenkých vrstev pomocí pulzního rozprašování duté katody Author(s) Soukup, R. J. (US)
Ianno, N.J. (US)
Huguenin-Love, J.L. (US)
Lauer, N.T. (US)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAISource Title Journal of Materials Science and Engineering. Roč. 3, č. 8 (2009), s. 1-4 Document Type Článek v odborném periodiku Grant 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic CEZ AV0Z10100522 - FZU-D (2005-2011) Language eng Country US Keywords hollow cathode * pulsed sputtering * 4H SiC Permanent Link http://hdl.handle.net/11104/0176779
Number of the records: 1