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Deposition of SiC thin films using pulsed sputtering of a hollow cathode

  1. 1.
    SYSNO0331189
    TitleDeposition of SiC thin films using pulsed sputtering of a hollow cathode
    TitleDepozice SiC tenkých vrstev pomocí pulzního rozprašování duté katody
    Author(s) Soukup, R. J. (US)
    Ianno, N.J. (US)
    Huguenin-Love, J.L. (US)
    Lauer, N.T. (US)
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Source Title Journal of Materials Science and Engineering. Roč. 3, č. 8 (2009), s. 1-4
    Document TypeČlánek v odborném periodiku
    Grant 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    CEZAV0Z10100522 - FZU-D (2005-2011)
    Languageeng
    CountryUS
    Keywords hollow cathode * pulsed sputtering * 4H SiC
    Permanent Linkhttp://hdl.handle.net/11104/0176779
     
Number of the records: 1  

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