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Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition
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SYSNO 0047572 Title Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition Title Depozice organosilikonových tenkých vrstev pomocí PECVD Author(s) Zajíčková, L. (CZ)
Buršíková, V. (CZ)
Sťahel, P. (CZ)
Buršík, Jiří (UFM-A) RID, ORCID
Peřina, Vratislav (UJF-V) RID
Macková, Anna (UJF-V) RID, ORCID, SAI
Dubroka, A. (CZ)Issue data Pardubice: Univerzita Pardubice, 2006 Conference International Conference of Solid State Chemistry /7./, Pardubice, 24.09.2006-29.09.2006 Document Type Konferenční sborník (tuzemská konf.) CEZ AV0Z10480505 - UJF-V (2005-2011) AV0Z20410507 - UFM-A (2005-2011) Language eng Country CZ Keywords organosilicon polymers * PECVD * surface analyses Permanent Link http://hdl.handle.net/11104/0138433
Number of the records: 1