Quantitative depth profiling of K-doped fullerene films using XPS and SIMS

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SYSNO	0031295
Title	Quantitative depth profiling of K-doped fullerene films using XPS and SIMS
Author(s)	Oswald, S. (DE) Janda, Pavel (UFCH-W)_{RID, ORCID} Dunsch, L. (DE)
Source Title	Microchimica Acta. Roč. 141, 1-2 (2003), s. 79-85. - : Springer
Document Type	Článek v odborném periodiku
CEZ	AV0Z4040901 - UFCH-W
Language	eng
Country	AT
Keywords	XPS * SIMS * depth profiling * fullerenes * doping
Permanent Link	http://hdl.handle.net/11104/0132039

Number of the records: 1