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High temperature nanoindentation testing of amorphous SiC and B.sub.4./sub.C thin films
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SYSNO ASEP 0470728 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title High temperature nanoindentation testing of amorphous SiC and B4C thin films Author(s) Čtvrtlík, Radim (FZU-D) RID, ORCID
Tomáštík, Jan (FZU-D) RID, ORCID
Schovánek, P. (CZ)Source Title Defect and Diffusion Forum. Vol. 368, Local Mechanical Properties. Proceedings of the 12th International Conference Local Mechanical Properties. - Zürich : Trans Tech Publications Ltd, 2016 - ISSN 1012-0386 - ISBN 978-3-03835-720-9 Pages s. 115-118 Number of pages 4 s. Publication form Print - P Action 12th International Conference on Local Mechanical Properties Event date 04.11.2016 - 06.11.2016 VEvent location Liberec Country CZ - Czech Republic Event type WRD Language eng - English Country CH - Switzerland Keywords boron carbide ; elevated temperatures ; mechanical properties ; nanoindentation ; silicon carbide ; thin films Subject RIV JH - Ceramics, Fire-Resistant Materials and Glass Institutional support FZU-D - RVO:68378271 EID SCOPUS 84971003200 DOI 10.4028/www.scientific.net/DDF.368.115 Annotation Amorphous silicon carbide (a-SiC) and boron carbide (a-B4C) thin films were deposited using reactive magnetron sputtering of SiC and B4C target, respectively. Nanoindentation tests performed up to 450 °C in air were performed to explore and compare their hardness and elastic modulus. Hardness of a-B4C film decreases at smaller rate in comparison to a-SiC film up to 450 °C. Similarly, elastic modulus value of B4C is more stable with temperature than that of a-SiC. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2017
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