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Titania Nanofilms and Their Doped Equivalents
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SYSNO ASEP 0329702 Document Type C - Proceedings Paper (int. conf.) R&D Document Type The record was not marked in the RIV Title Titania Nanofilms and Their Doped Equivalents Title Tenké vrstvy oxidu titaničitého a jeho kovy dopovaných ekvivalentů Author(s) Krejčíková, Simona (UCHP-M) RID, ORCID, SAI
Matějová, Lenka (UCHP-M) RID, ORCID, SAI
Šolcová, Olga (UCHP-M) RID, ORCID, SAI
Čapek, L. (CZ)Source Title Book of Abstracts. - Sofia : -, 2009 / Petrova G.P. ; Vayssilov G.N. - ISBN 978-954-323-558-2 Pages s. 61 Number of pages 1 s. Action International Symposium Advanced Micro- and Mesoporous Materials /3./ Event date 06.09.2009-09.09.2009 VEvent location Albena Country BG - Bulgaria Event type WRD Language eng - English Country BG - Bulgaria Keywords titania ; photocatalysis ; thin layer Subject RIV CC - Organic Chemistry R&D Projects KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GD203/08/H032 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z40720504 - UCHP-M (2005-2011) Annotation Titania belong to nanoporous materials with huge application potential in photocatalysis, dye-sensitized photoelectrochemical cells, electrochromic devices, sensors and other applications, especially in the form of nanolayers. Doping with metals has been largely employed with the aim to enhance the photocatalytic activity of TiO2. Differences in surface morfology, texture and crystallinity influence their catalytic impact. Therefore special attention is focused on the detailed textural and structural characterizations of thin titania-zirconia nanolayers prepared by sol-gel templated route. Gel nanolayers were prepared by three-times repeated dip-coating of silica glass into transparent homogeneous sol. Transparent amorphous gel layer was converted to crystalline layer by calcination. For deeper textural and structural characterization of prepared layers nitrogen physical adsorption, XRD, elementar analyses and UV-VIS spectra were performed. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2010
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