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Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis

SYSNO ASEP	0567910
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis
Author(s)	Domonkos, M. (CZ) Kromka, Alexander (FZU-D)_{RID, ORCID, SAI}
Number of authors	2
Article number	2642
Source Title	Symmetry-Basel. - : MDPI Roč. 14, č. 12 (2022)
Number of pages	16 s.
Language	eng - English
Country	CH - Switzerland
Keywords	nanosphere lithography ; self-assembly ; hexagonal symmetry ; plasma etching ; image analysis ; defect detection
Subject RIV	JA - Electronics ; Optoelectronics, Electrical Engineering
OECD category	Nano-materials (production and properties)
R&D Projects	LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Method of publishing	Open access
Institutional support	FZU-D - RVO:68378271
UT WOS	000903184900001
EID SCOPUS	85144876013
DOI	10.3390/sym14122642
Annotation	This paper reviews technological challenges in NSL mask preparation, its modification, and quality control. Spin coating with various process parameters (substrate wettability, solution properties, spin coating operating parameters) are discussed to create a uniform monolayer from monodisperse polystyrene (PS) nanospheres with a diameter of 0.2–1.5 um. The prepared highly ordered nanopatterned arrays (from circular, triangular, pillar-shaped structures) are applicable in many different fields (plasmonics, photonics, sensorics, biomimetic surfaces, life science, etc.).
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2023
Electronic address	https://hdl.handle.net/11104/0339173

Number of the records: 1