Copper tungsten oxide (Cu.sub.x./sub.WO.sub.y./sub.) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

Hrubantová, Aneta; Hippler, Rainer; Wulff, H.; Čada, Martin; Gedeon, O.; Jiříček, Petr; Houdková, Jana; Olejníček, Jiří; Nepomniashchaia, Natalia; Helm, C.A.; Hubička, Zdeněk

doi:https://dx.doi.org/10.1063/5.0123075

Number of the records: 1

Copper tungsten oxide (Cu.sub.x./sub.WO.sub.y./sub.) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

1.

SYSNO ASEP	0566773
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Copper tungsten oxide (Cu_xWO_y) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
Author(s)	Hrubantová, Aneta (FZU-D)_ORCID Hippler, Rainer (FZU-D)_ORCID Wulff, H. (DE) Čada, Martin (FZU-D)_{RID, ORCID, SAI} Gedeon, O. (CZ) Jiříček, Petr (FZU-D)_{RID, ORCID, SAI} Houdková, Jana (FZU-D)_{RID, ORCID} Olejníček, Jiří (FZU-D)_{RID, ORCID} Nepomniashchaia, Natalia (FZU-D)_ORCID Helm, C.A. (DE) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI}
Number of authors	11
Article number	215301
Source Title	Journal of Applied Physics. - : AIP Publishing - ISSN 0021-8979 Roč. 132, č. 21 (2022)
Number of pages	13 s.
Language	eng - English
Country	US - United States
Keywords	HiPIMS ; sputtering ; photoelectrochemical activity ; FTO glass ; film properties
Subject RIV	BL - Plasma and Gas Discharge Physics
OECD category	Coating and films
R&D Projects	EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA21-04477S GA ČR - Czech Science Foundation (CSF)
Research Infrastructure	CzechNanoLab - 90110 - Vysoké učení technické v Brně
Method of publishing	Open access
Institutional support	FZU-D - RVO:68378271
UT WOS	000894517100001
EID SCOPUS	85144137293
DOI	10.1063/5.0123075
Annotation	Copper tungsten oxide films are deposited with the help of reactive high power impulse magnetron sputtering (HiPIMS) in an argon/oxygen gas mixture. Two magnetrons, one equipped with a tungsten target and the other with a copper target, are employed. The HiPIMS discharge is operated with a repetition frequency of f ¼ 100 Hz. Pulse widths of 100 and 20 μs separated by 25 μs are chosen for the tungsten and copper target, respectively. Films deposited on two different glass substrates [soda lime glass and fluorine doped tin oxide (FTO) coated glass] are characterized by energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectroscopy, and ellipsometry. Photoelectrochemical activity was investigated by linear voltammetry. Annealed films deposited on FTO glass are composed of WO3 and CuWO4 or Cu2WO4 crystal phases.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2023
Electronic address	https://hdl.handle.net/11104/0338068

Number of the records: 1