Number of the records: 1
One-step 3D microstructuring of PMMA using MeV light ions
- 1.
SYSNO ASEP 0565861 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title One-step 3D microstructuring of PMMA using MeV light ions Author(s) Romanenko, Oleksandr V. (UJF-V) ORCID, SAI
Jagerová, Adéla (UJF-V) ORCID, SAI
Borodkin, Andrei (URE-Y)
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Macková, Anna (UJF-V) RID, ORCID, SAINumber of authors 5 Article number 02001 Source Title EPJ Web of Conferences, 261. - Les ulis : EDP sciences, 2022 Number of pages 6 s. Publication form Online - E Action Applied Nuclear Physics Conference (ANPC 2021) Event date 12.09.2021 - 17.09.2021 VEvent location Prague Country CZ - Czech Republic Event type WRD Language eng - English Country FR - France Keywords PMA ; 3D microstructures ; ion beam lithography OECD category Nuclear physics R&D Projects GA19-02482S GA ČR - Czech Science Foundation (CSF) Research Infrastructure CANAM II - 90056 - Ústav jaderné fyziky AV ČR, v. v. i. Institutional support UJF-V - RVO:61389005 ; URE-Y - RVO:67985882 DOI 10.1051/epjconf/202226102001 Annotation The conventional procedure for creating 3D microstructures in resists by ion beam lithography consists of two stages – exposure and developing. However, single stage of manufacturing 3D structures in resist is also possible. Irradiation of PMMA can cause it to shrink. This feature of the polymer can be used for one-step three-dimensional microstructuring, which simplifies the manufacturing process. The shrinkage of PMMA film on a substrate has been extensively studied, while research on free-standing film is not comprehensive. The use of free-standing PMMA film allows the creation of a flexible material with 3D microstructures, which can be used in medicine, optics, and electronics. The question here is whether the results obtained for the PMMA film on the substrate are applicable to the freestanding film. Since the nature of shrinking is outgassing of volatile products, the film on the substrate has only one surface for the release of gases, while in the free-standing film, gases can be released from the sample from both sides. Therefore, the shrinking in the free-standing film occurs on both sides. The aim of this work is to study the shrinkage of the free-standing film and compare it with that of the film of the same thickness coated on the substrate. Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2023 Electronic address https://doi.org/10.1051/epjconf/202226102001
Number of the records: 1