Number of the records: 1
Advances in RF glow discharge optical emission spectrometry characterization of intrinsic and boron-doped diamond coatings
- 1.
SYSNO ASEP 0561905 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Advances in RF glow discharge optical emission spectrometry characterization of intrinsic and boron-doped diamond coatings Author(s) Sharma, Dhananjay K. (FZU-D) ORCID
Girao, A.V. (PT)
Chapon, P. (FR)
Neto, M.A. (PT)
Oliveira, F.J. (PT)
Silva, R.F. (PT)Number of authors 6 Source Title ACS Applied Materials and Interfaces. - : American Chemical Society - ISSN 1944-8244
Roč. 14, č. 5 (2022), s. 7405-7416Number of pages 12 s. Language eng - English Country US - United States Keywords GD-OES ; diamond ; boron doping ; XPS ; Rietveld refinement ; Raman spectroscopy ; HFCVD OECD category Fluids and plasma physics (including surface physics) R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Limited access Institutional support FZU-D - RVO:68378271 UT WOS 000757775400001 EID SCOPUS 85124156495 DOI 10.1021/acsami.1c20785 Annotation Accurate determination of the effective doping range within diamond thin films is important for fine-tuning of electrical conductivity. Nevertheless, it is not easily attainable by the commonly adopted techniques. In this work, pulsed RF glow discharge optical emission spectrometry (GD-OES) combined with ultrafast sputtering (UFS) is applied for the first time to acquire elemental depth profiles of intrinsic diamond coatings and boron content bulk distribution in films. The GD-OES practical advances presented here enabled quick elemental profiling with noteworthy depth resolution and determination of the film interfaces. The erosion rates and layer thicknesses were measured using differential interferometric profiling (DIP), demonstrating a close correlation between the coating thickness and the carbon/hydrogen gas ratio. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2023 Electronic address https://doi.org/10.1021/acsami.1c20785
Number of the records: 1