Number of the records: 1  

Thin layered graphitic carbon nitride for photochemical degradation in micro photoreactor.

  1. 1.
    SYSNO ASEP0560698
    Document TypeA - Abstract
    R&D Document TypeThe record was not marked in the RIV
    R&D Document TypeNení vybrán druh dokumentu
    TitleThin layered graphitic carbon nitride for photochemical degradation in micro photoreactor.
    Author(s) Vanluchene, Anna RID, ORCID, SAI
    Stavárek, Petr (UCHP-M) RID, ORCID, SAI
    Dolai, Susmita (UCHP-M) SAI
    Dzik, P. (CZ)
    Fajgar, Radek (UCHP-M) RID, ORCID, SAI
    Soukup, Karel (UCHP-M) RID, SAI, ORCID
    Klusoň, Petr (UCHP-M) RID, ORCID, SAI
    ActionInternational Congress of Chemical and Process Engineering CHISA 2022 /26./
    Event date21.08.2022 - 25.08.2022
    VEvent locationPrague
    CountryCZ - Czech Republic
    Event typeWRD
    Languageeng - English
    Keywordsphotoreactor ; carbon ; photochemical degradation
    OECD categoryChemical process engineering
    Institutional supportUCHP-M - RVO:67985858
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2023
Number of the records: 1  

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