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Thin layered graphitic carbon nitride for photochemical degradation in micro photoreactor.
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SYSNO ASEP 0560698 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Thin layered graphitic carbon nitride for photochemical degradation in micro photoreactor. Author(s) Vanluchene, Anna RID, ORCID, SAI
Stavárek, Petr (UCHP-M) RID, ORCID, SAI
Dolai, Susmita (UCHP-M) SAI
Dzik, P. (CZ)
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Soukup, Karel (UCHP-M) RID, SAI, ORCID
Klusoň, Petr (UCHP-M) RID, ORCID, SAIAction International Congress of Chemical and Process Engineering CHISA 2022 /26./ Event date 21.08.2022 - 25.08.2022 VEvent location Prague Country CZ - Czech Republic Event type WRD Language eng - English Keywords photoreactor ; carbon ; photochemical degradation OECD category Chemical process engineering Institutional support UCHP-M - RVO:67985858 Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2023
Number of the records: 1