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In situ optical and electrical analysis of transient plasmas generated by ns-laser ablation for Ag nanostructured film production

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    SYSNO ASEP0546676
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleIn situ optical and electrical analysis of transient plasmas generated by ns-laser ablation for Ag nanostructured film production
    Author(s) Irimiciuc, Stefan (FZU-D) ORCID
    Chertopalov, Sergii (FZU-D) ORCID
    Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Fekete, Ladislav (FZU-D) RID, ORCID
    Vondráček, Martin (FZU-D) RID, ORCID
    Novotný, Michal (FZU-D) RID, ORCID, SAI
    Craciun, V. (RO)
    Lančok, Ján (FZU-D) RID, ORCID
    Number of authors8
    Article number110528
    Source TitleVacuum. - : Elsevier - ISSN 0042-207X
    Roč. 193, Nov. (2021)
    Number of pages10 s.
    Languageeng - English
    CountryGB - United Kingdom
    KeywordsLangmuir probe ; optical emission spectroscopy ; perturbative probe ; plasma dynamics ; thickness profile ; Ag nanoparticles ; laser ablation
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    R&D ProjectsEF16_019/0000760 GA MŠk - Ministry of Education, Youth and Sports (MEYS)
    GA20-21069S GA ČR - Czech Science Foundation (CSF)
    Method of publishingLimited access
    Institutional supportFZU-D - RVO:68378271
    UT WOS000702522400003
    EID SCOPUS85112483940
    DOI10.1016/j.vacuum.2021.110528
    AnnotationThe continuous effort for transitioning pulsed laser deposition (PLD) technique from an experimental tool into an industrial one can be sustained by the use of complex tools for in situ real-time monitoring of the deposition process. Langmuir Probe (LP) and optical emission spectroscopy (OES) measurements were used for plasma monitoring during PLD of silver films under various Ar pressure conditions. The LP measurements revealed a multi-structured distribution of the ions, which was strongly influenced by the increase of Ar pressure.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2022
    Electronic addresshttps://doi.org/10.1016/j.vacuum.2021.110528
Number of the records: 1