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In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu.sub.2./sub.O.sub.3./sub.

SYSNO ASEP	0546180
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu₂O₃
Author(s)	Irimiciuc, Stefan (FZU-D)_ORCID More Chevalier, Joris (FZU-D)_ORCID Chertopalov, Sergii (FZU-D)_ORCID Fekete, Ladislav (FZU-D)_{RID, ORCID} Novotný, Michal (FZU-D)_{RID, ORCID, SAI} Havlová, Šárka (FZU-D)_ORCID Poupon, Morgane (FZU-D)_ORCID Zikmund, Tomáš (FZU-D) Kůsová, Kateřina (FZU-D)_{RID, ORCID} Lančok, Ján (FZU-D)_{RID, ORCID}
Number of authors	10
Article number	140
Source Title	Applied Physics B-Lasers and Optics. - : Springer - ISSN 0946-2171 Roč. 127, č. 10 (2021)
Number of pages	9 s.
Language	eng - English
Country	DE - Germany
Keywords	expansion ; dynamics ; ablation ; target ; oxides
Subject RIV	BL - Plasma and Gas Discharge Physics
OECD category	Coating and films
R&D Projects	EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA18-17834S GA ČR - Czech Science Foundation (CSF)
Method of publishing	Limited access
Institutional support	FZU-D - RVO:68378271
UT WOS	000696523600001
EID SCOPUS	85115095563
DOI	10.1007/s00340-021-07689-4
Annotation	The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2022
Electronic address	https://doi.org/10.1007/s00340-021-07689-4

Number of the records: 1