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Determination of Composition and Thickness of MnSi and MnGe Layers by EDS.

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    SYSNO ASEP0541357
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleDetermination of Composition and Thickness of MnSi and MnGe Layers by EDS.
    Author(s) Koštejn, Martin (UCHP-M) RID, SAI, ORCID
    Fajgar, Radek (UCHP-M) RID, ORCID, SAI
    Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
    Jandová, Věra (UCHP-M) RID, ORCID, SAI
    Novotný, F. (CZ)
    Article number40
    Source TitleJournal of Nondestructive Evaluation. - : Springer - ISSN 0195-9298
    Roč. 39, č. 2 (2020)
    Number of pages11 s.
    Languageeng - English
    CountryUS - United States
    Keywordscomposition ; area density ; thickness
    Subject RIVCF - Physical ; Theoretical Chemistry
    OECD categoryPhysical chemistry
    R&D ProjectsGA18-15613S GA ČR - Czech Science Foundation (CSF)
    Method of publishingOpen access with time embargo (20.05.2021)
    Institutional supportUCHP-M - RVO:67985858
    UT WOS000534240700001
    EID SCOPUS85085686368
    DOI10.1007/s10921-020-00685-2
    AnnotationDetermination of composition and thickness is crucial for the preparation of thin layers. A separate measurement is possible, however, it could be time-consuming, and each technique requires a specifically prepared sample. Therefore, a combined, fast, and reliable technique would be advantageous. Calibration of energy dispersive X-ray spectroscopy (EDS) integrated with scanning electron microscope (SEM) by X-ray photoelectron spectroscopy (XPS), weighting balance and atomic force microscopy (AFM) were performed for simultaneous and non-destructive concentration, area density and thickness measurements of MnSi and MnGe thin layers prepared by a reactive pulsed laser deposition (PLD). The linearity of calibrations was supported by Monte Carlo calculations. The calibrations enabled the evaluation of Mn concentration with a deviation better than 2.7 at.%. The area density was determined with a deviation better than 6.8 µg/cm2, and the thickness was determined with a deviation better than 4.1 nm for samples measured with a standard substrate. The thickness measurement calibration omitting the standard substrate measurement resulted in the higher deviation of 7.6 nm, however, it enabled double sample throughput and spatial analyses.


    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2022
    Electronic addresshttp://hdl.handle.net/11104/0318917
Number of the records: 1  

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