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Possibilities of laser recrystallization and laser ablation in thin-layer structures based on a-Si:H
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SYSNO ASEP 0540759 Document Type A - Abstract R&D Document Type O - Ostatní Title Possibilities of laser recrystallization and laser ablation in thin-layer structures based on a-Si:H Author(s) Stuchlík, Jiří (FZU-D) RID, ORCID
Stuchlíková, The-Ha (FZU-D) RID, ORCID
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Kupčík, Jaroslav (FZU-D) ORCID
Remeš, Zdeněk (FZU-D) RID, ORCIDNumber of authors 5 Source Title Online, 2020 Number of pages 22 s. Action 4th BIATRI Workshop Event date 09.12.2020 - 10.12.2020 VEvent location Online Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords CVD ; thin films ; a-Si:H ; nanoparticles Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) Subject RIV - cooperation Institute of Chemical Process Fundamentals - Solid Matter Physics ; Magnetism R&D Projects LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GC19-02858J GA ČR - Czech Science Foundation (CSF) EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 ; UCHP-M - RVO:67985858 Annotation Our goal is to enhance optoelectronic properties and light conversion efficiency in hydrogenated silicon thin films by in-situ embedded nanoparticles using radio frequency chemical vapor deposition (RF CVD) combined with other methods such as molecular beam epitaxy, magnetron sputtering, Langmuir/Blodgett method, reactive deposition epitaxy, laser surface treatment, laser ablation, reactive laser ablation, vacuum evaporation and plasma treatment. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2021
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