Number of the records: 1  

Advances in chemical lift-off lithography

    1.
    SYSNO ASEP0535135
    Document TypeA - Abstract
    R&D Document TypeThe record was not marked in the RIV
    R&D Document TypeNení vybrán druh dokumentu
    TitleAdvances in chemical lift-off lithography
    Author(s) Cheung, K. (US)
    Goronzy, D. P. (US)
    Stemer, D. (US)
    Zhao, CH. (US)
    Young, T. (US)
    Belling, J. (US)
    Baše, Tomáš (UACH-T) RID, SAI, ORCID
    Andrews, A. (US)
    Weiss, P. (US)
    Number of authors9
    Article number277-ANYL
    Source TitleAbstracts of papers - American Chemical Society - ISSN 0065-7727
    Roč. 258, AUG (2019)
    Number of pages1 s.
    Publication formPrint - P
    ActionACS Fall National Meeting and Exposition
    Event date25.08.2019 - 29.08.2019
    VEvent locationSan Diego
    CountryUS - United States
    Event typeWRD
    Languageeng - English
    CountryUS - United States
    Keywordslift-off lithography
    Subject RIVCA - Inorganic Chemistry
    OECD categoryInorganic and nuclear chemistry
    Institutional supportUACH-T - RVO:61388980
    UT WOS000525055501201
    WorkplaceInstitute of Inorganic Chemistry
    ContactJana Kroneislová, krone@iic.cas.cz, Tel.: 311 236 931
    Year of Publishing2021
Number of the records: 1  

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