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Filling, depinning, unbinding: Three adsorption regimes for nanocorrugated substrates.
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SYSNO ASEP 0531839 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Filling, depinning, unbinding: Three adsorption regimes for nanocorrugated substrates. Author(s) Malijevský, Alexandr (UCHP-M) RID, ORCID, SAI Article number 012804 Source Title Physical Review E. - : American Physical Society - ISSN 2470-0045
Roč. 102, č. 1 (2020)Number of pages 13 s. Language eng - English Country US - United States Keywords capillary condensation ; phase-equilibria ; interface Subject RIV CF - Physical ; Theoretical Chemistry OECD category Physical chemistry R&D Projects GA20-14547S GA ČR - Czech Science Foundation (CSF) Method of publishing Open access Institutional support UCHP-M - RVO:67985858 UT WOS 000550130600002 EID SCOPUS 85089510217 DOI https://doi.org/10.1103/PhysRevE.102.012804 Annotation We study adsorption at periodically corrugated substrates formed by scoring rectangular grooves into a planar solid wall which interacts with the fluid via long-range (dispersion) forces. The grooves are assumed to be macroscopically long but their depth, width, and separations can all be molecularly small. We show that the entire adsorption process can be divided into three parts consisting of filling the grooves by a capillary liquid, depinning of the liquid-gas interface from the wall edges and unbinding of the interface from the top of the wall, which is accompanied by a rapid but continuous flattening of its shape. Using a nonlocal density functional theory and mesoscopic interfacial models all the regimes are discussed in some detail to reveal the complexity of the entire process and subtle aspects that affect its behavior. In particular, it is shown that the nature of the depinning phenomenon is governed by the width of the wall pillars (separating grooves), while the width of the grooves only controls the location of the depinning first-order transition, if present. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2021 Electronic address http://hdl.handle.net/11104/0310480
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