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Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system
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SYSNO ASEP 0531792 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system Author(s) Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Zlámal, M. (CZ)
Olejníček, Jiří (FZU-D) RID, ORCID
Tvarog, Drahoslav (FZU-D) ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Krýsa, J. (CZ)Number of authors 6 Article number 232 Source Title Coatings. - : MDPI
Roč. 10, č. 3 (2020), s. 1-14Number of pages 14 s. Language eng - English Country CH - Switzerland Keywords photocathode film ; r-HiPIMS plus ECWR plasma ; r-HiPIMS plasma ; copper iron oxide ; photocurrent Subject RIV BL - Plasma and Gas Discharge Physics OECD category Materials engineering R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) FV20580 GA MPO - Ministry of Industry and Trade (MPO) GA17-20008S GA ČR - Czech Science Foundation (CSF) Method of publishing Open access Institutional support FZU-D - RVO:68378271 UT WOS 000524211800037 EID SCOPUS 85083043387 DOI 10.3390/coatings10030232 Annotation A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive highpower impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFexOy thin films on glass with SnO2F conductive layer (FTO). Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2021 Electronic address http://hdl.handle.net/11104/0310408
Number of the records: 1