Number of the records: 1  

Laser-generated Cu plasma in vacuum and in nitrogen gas

  1. 1.
    SYSNO ASEP0525527
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleLaser-generated Cu plasma in vacuum and in nitrogen gas
    Author(s) Torrisi, L. (IT)
    Cutroneo, Mariapompea (UJF-V) ORCID, RID, SAI
    Torrisi, Alfio (UJF-V) RID, ORCID
    Number of authors3
    Article number109422
    Source TitleVacuum. - : Elsevier - ISSN 0042-207X
    Roč. 178, č. 8 (2020)
    Number of pages7 s.
    Publication formPrint - P
    Languageeng - English
    CountryGB - United Kingdom
    KeywordsCu plasma ; laser-generated plasma ; Nitrogen gas environment ; SiC ; TOF
    Subject RIVBG - Nuclear, Atomic and Molecular Physics, Colliders
    OECD categoryMaterials engineering
    R&D ProjectsEF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingLimited access
    Institutional supportUJF-V - RVO:61389005
    UT WOS000541439800009
    EID SCOPUS85084337813
    DOI10.1016/j.vacuum.2020.109422
    AnnotationA pulsed ns IR laser at about 10(10) W/cm(2) intensity is employed to irradiate a Cu target placed in a vacuum and in nitrogen gas. The produced plasma is characterized in terms of emitted ions and photons as a function of the nitrogen pressure in the chamber. The mechanisms of ion gas interactions are investigated in terms of Cu ion energy loss and X-ray attenuation using an ion collector and a SiC detector. A fast CCD camera in the visible region has produced the collision images of the ions with the nitrogen molecules. A plasma temperature of about 44 eV, an emission of soft X-rays up to about 100 eV, an ablation yield of about 2.4 x 10(15) atoms/pulse, a maximum Cu ion acceleration of 1.4 keV and a maximum ionization up to Cu9+ were measured in high vacuum.
    WorkplaceNuclear Physics Institute
    ContactMarkéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228
    Year of Publishing2021
    Electronic addresshttps://doi.org/10.1016/j.vacuum.2020.109422
Number of the records: 1  

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