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Acquisition of the dopant contrast in semiconductors with slow electrons
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SYSNO ASEP 0525062 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Acquisition of the dopant contrast in semiconductors with slow electrons Author(s) Frank, Luděk (UPT-D) RID, SAI, ORCID
Hovorka, Miloš (UPT-D)
El Gomati, M. M. (GB)
Müllerová, Ilona (UPT-D) RID, SAI, ORCID
Mika, Filip (UPT-D) RID, SAI, ORCID
Mikmeková, Eliška (UPT-D) RIDNumber of authors 6 Article number 146836 Source Title Journal of Electron Spectroscopy and Related Phenomena. - : Elsevier - ISSN 0368-2048
Roč. 241, MAY (2020)Number of pages 10 s. Publication form Print - P Language eng - English Country NL - Netherlands Keywords semiconductors ; dopant contrast ; low energy SEM ; PEEM ; mirror electron microscopy ; surface treatments Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering OECD category Electrical and electronic engineering R&D Projects TE01020118 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Open access Institutional support UPT-D - RVO:68081731 UT WOS 000540723700005 EID SCOPUS 85063225896 DOI 10.1016/j.elspec.2019.03.004 Annotation Methods available for the mapping of dopants in silicon-based semiconductor structures with p-type as well as n-type doped patterns using low and very-low-energy electrons are reviewed together with the results of demonstration experiments. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2021 Electronic address https://www.sciencedirect.com/science/article/pii/S036820481830135X
Number of the records: 1