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Ion channelling effect and damage accumulation in yttria-stabilized zirconia implanted with Ag ions

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    SYSNO ASEP0524526
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleIon channelling effect and damage accumulation in yttria-stabilized zirconia implanted with Ag ions
    Author(s) Mikšová, Romana (UJF-V) RID, ORCID, SAI
    Malinský, Petr (UJF-V) RID, ORCID, SAI
    Harcuba, P. (CZ)
    Veselý, J. (CZ)
    Holý, V. (CZ)
    Kentsch, U. (DE)
    Macková, Anna (UJF-V) RID, ORCID, SAI
    Number of authors7
    Source TitleNuclear Instruments & Methods in Physics Research Section B. - : Elsevier - ISSN 0168-583X
    Roč. 474, č. 7 (2020), s. 29-34
    Number of pages6 s.
    Publication formPrint - P
    Languageeng - English
    CountryNL - Netherlands
    Keywordsion-irradiation of crystals ; Yttria-stabilized zirconia ; RBS-channeling ; Ag particles
    Subject RIVBG - Nuclear, Atomic and Molecular Physics, Colliders
    OECD categoryNuclear related engineering
    R&D ProjectsEF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GA18-03346S GA ČR - Czech Science Foundation (CSF)
    LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingLimited access
    Institutional supportUJF-V - RVO:61389005
    UT WOS000531672400006
    EID SCOPUS85083821229
    DOI10.1016/j.nimb.2020.04.008
    AnnotationYttria stabilized zirconia (YSZ) is well known as a radiation-resistant material. In this study, we present results from 400 keV Ag+ implantations of the (1 0 0) YSZ single crystals to fluences ranging from 5 x 10(15) to 5 x 10(16) cm(-2). The damage depth profiling and accumulation were probed using Rutherford backscattering spectrometry in the channelling mode (RBS-C), Transmission electron microscopy (TEM) and X-ray diffraction (XRD). The axial channelling effect of 2 MeV He+ ions in the implanted YSZ was studied. RBS-C provides us with detailed information about the displaced atoms density depth profiles progressing into greater depths, especially in the case of higher fluence. TEM was utilized to characterize the microstructure evolution and damage accumulation in the buried layer after the implantation. At the highest fluence (5 x 10(16) cm(-2)), Ag depth profile in the depth of 30-130 nm was identified in TEM bright and dark field images as well as in the electron diffraction patterns. Ag depth profiles are in agreement with depth profiles determined by RBS which show maximum Ag concentration in the depth of 94 nm. The reason for the decrease of the deformation identified by XRD in the vertical direction is the defect formation.
    WorkplaceNuclear Physics Institute
    ContactMarkéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228
    Year of Publishing2021
    Electronic addresshttps://doi.org/10.1016/j.nimb.2020.04.008
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