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Towards the evaluation of defects in MoSinf2/inf using cryogenic photoluminescence spectroscopy

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    SYSNO ASEP0523058
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleTowards the evaluation of defects in MoSinf2/inf using cryogenic photoluminescence spectroscopy
    Author(s) Verhagen, T. (CZ)
    Guerra, Valentino Libero Pio (UFCH-W) ORCID, RID, SAI
    Haider, Golam (UFCH-W) ORCID, RID
    Kalbáč, Martin (UFCH-W) RID, ORCID
    Vejpravová, J. (CZ)
    Source TitleNanoscale. - : Royal Society of Chemistry - ISSN 2040-3364
    Roč. 12, č. 5 (2020), s. 3019-3028
    Number of pages10 s.
    Languageeng - English
    CountryGB - United Kingdom
    KeywordsMolybdenum compounds ; Transition metals ; Dichalcogenides TMDs
    Subject RIVCF - Physical ; Theoretical Chemistry
    OECD categoryPhysical chemistry
    R&D ProjectsGA18-20357S GA ČR - Czech Science Foundation (CSF)
    EF16_013/0001821 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LM2015073 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingOpen access
    Institutional supportUFCH-W - RVO:61388955
    UT WOS000516533300063
    EID SCOPUS85079079417
    DOI10.1039/c9nr07246b
    AnnotationCharacterization of the type and density of defects in two-dimensional (2D) transition metal dichalcogenides (TMDs) is important as the nature of these defects strongly influences the electronic and optical properties of the material, especially its photoluminescence (PL). Defect characterization is not as straightforward as it is for graphene films, where the D and D′ Raman scattering modes easily indicate the density and type of defects in the graphene layer. Thus, in addition to the Raman scattering analysis, other spectroscopic techniques are necessary to perform detailed characterization of atomically thin TMD layers. We demonstrate that PL spectroscopy performed at liquid helium temperatures reveals the key fingerprints of defects in TMDs and hence provides valuable information about their origin and concentration. In our study, we address defects in chemical vapor deposition (CVD)-grown MoS2 monolayers. A significant difference is observed between the as-grown monolayers compared with the CVD-grown monolayers transferred onto a Si/SiO2 substrate, which contain extra defects due to the transfer process. We demonstrate that the temperature-dependent Raman and PL micro-spectroscopy techniques enable disentangling the contributions and locations of various defect types in TMD systems.
    WorkplaceJ. Heyrovsky Institute of Physical Chemistry
    ContactMichaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
    Year of Publishing2021
    Electronic addresshttp://hdl.handle.net/11104/0307466
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