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Characterization of graphene oxide film by implantation of low energy copper ions
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SYSNO ASEP 0520862 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Characterization of graphene oxide film by implantation of low energy copper ions Author(s) Cutroneo, Mariapompea (UJF-V) ORCID, RID, SAI
Torrisi, L. (IT)
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Macková, Anna (UJF-V) RID, ORCID, SAI
Malinský, Petr (UJF-V) RID, ORCID, SAI
Torrisi, Alfio (UJF-V) RID, ORCID
Stammers, James H. (UJF-V)
Sofer, Z. (CZ)
Silipigni, L. (IT)
Fazio, B. (IT)
Fazio, M. (IT)
Bottger, R. (DE)Number of authors 12 Source Title Nuclear Instruments & Methods in Physics Research Section B. - : Elsevier - ISSN 0168-583X
Roč. 460, č. 12 (2019), s. 169-174Number of pages 6 s. Publication form Print - P Action 28th International Conference on Atomic Collisions in Solids (ICACS) / 10th International Symposium on Swift Heavy Ions in Matter (SHIM) Event date 01.07.2018 - 07.07.2018 VEvent location Caen Country FR - France Event type WRD Language eng - English Country NL - Netherlands Keywords low energy copper ions ; ion implantation ; composition graphene oxide Subject RIV BG - Nuclear, Atomic and Molecular Physics, Colliders OECD category Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect) R&D Projects LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA16-05167S GA ČR - Czech Science Foundation (CSF) EF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Limited access Institutional support UJF-V - RVO:61389005 UT WOS 000504510900032 EID SCOPUS 85063340901 DOI 10.1016/j.nimb.2019.03.021 Annotation Graphene oxide (GO) is an electrical insulator as most of the carbon atoms in this material are spa-hybridized. Its physical, optical and chemical properties depend on the type and degree of reduction process. Presently, copper ion irradiation of GO foil has been performed at Ion Beam Center of the Helmholtz-Zentrum Dresden-Rossendorf to investigate the behavior of a set of GO foils under this irradiation at low energy and different fluences up to 5 x 10(16) ions/cm(2). The compositional and optical properties of graphene oxide have been studied as a function of the fluences of implanted copper ions in the wavelength range 400-1000 nm. The results of ellipsometry microscopy, helium Rutherford backscattering spectroscopy, elastic recoil detection analysis, Raman spectroscopy and SEM-EDX measurements will be presented and discussed. Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2020 Electronic address https://doi.org/10.1016/j.nimb.2019.03.021
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