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Magnesium Silicide and Germanide from Wastes as a Potential Source of CVD Precursors for Catalysts Preparation.
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SYSNO ASEP 0517231 Document Type C - Proceedings Paper (int. conf.) R&D Document Type The record was not marked in the RIV Title Magnesium Silicide and Germanide from Wastes as a Potential Source of CVD Precursors for Catalysts Preparation. Author(s) Bumba, Jakub (UCHP-M) SAI
Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Kaštánek, František (UCHP-M) RID, SAI, ORCID
Šolcová, Olga (UCHP-M) RID, ORCID, SAIArticle number O1. Source Title Poster presentations. - Sofia : Institute of Catalysis, Bulgarian Academy of Sciences, 2019 - ISBN N Pages s. 1-2 Number of pages 1 s. Publication form Online - E Action National Conference on Catalysis /16./ Event date 27.06.2019 VEvent location Sofia Country BG - Bulgaria Event type EUR Language eng - English Country BG - Bulgaria Keywords catalysts preparation ; wastes ; magnesium silicide and germanide Subject RIV CI - Industrial Chemistry, Chemical Engineering OECD category Chemical process engineering R&D Projects GA15-14228S GA ČR - Czech Science Foundation (CSF) TN01000048 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) Institutional support UCHP-M - RVO:67985858 Annotation Chemical vapour deposition (CVD) is a technology used for forming solid films of semiconductors, metals or alloys on a substrate from precursor in gas phase. Ultrapure semiconductors mainly of silicon, germanium, and their SiGe alloys are commonly used for production of electronic components like chips, transistors, optical parts, circuits, etc. However, a top purity is required for their application in electronic industry. Silanes (SinH2n+2), germanes (GenH2n+2) and germylsilanes (SixGeyHz) belong to common CVD precursors applied for creation the thin semiconductor layers. Regrettably, the traditional refining methods for preparation of CVD precursors from waste Si, Ge, or SiGe are energetically and technologically demanding, which is significantly reflected in their price. From that reason the newly patented process, in which waste photovoltaic panels and optical lenses served as raw materials, was tested to be the lucrative source of silicon or germanium for CVD precursors. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2020
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