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Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering

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    SYSNO ASEP0512095
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitlePhoto-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
    Author(s) Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Zlámal, M. (CZ)
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Kment, Štěpán (FZU-D) RID, ORCID
    Krysa, J. (CZ)
    Number of authors5
    Source TitleCatalysis Today. - : Elsevier - ISSN 0920-5861
    Roč. 328, May (2019), s. 29-34
    Number of pages6 s.
    Languageeng - English
    CountryNL - Netherlands
    Keywordshigh power impulse magnetron sputtering ; reactive sputtering ; magnetron discharge ; photocathode ; photocurrent ; copper oxide
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    R&D ProjectsGA17-20008S GA ČR - Czech Science Foundation (CSF)
    EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingLimited access
    Institutional supportFZU-D - RVO:68378271
    UT WOS000461462200006
    EID SCOPUS85057216402
    DOI10.1016/j.cattod.2018.11.034
    AnnotationCopper oxide thin films were deposited by a reactive high power impulse magnetron sputtering (r-HIPIMS) on glass substrates with a SnO2:F (FTO) layer. The pulse magnetron discharge was analyzed via the radio frequency (RF) Sobolewski probe, used for the time-resolved measurement of ion flux density on the substrate. Pulsed discharge current and voltage waveforms were analyzed.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2020
    Electronic addresshttps://doi.org/10.1016/j.cattod.2018.11.034
Number of the records: 1  

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