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Pulsed Laser Deposition under Low Background Gas Pressure.
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SYSNO ASEP 0508744 Document Type C - Proceedings Paper (int. conf.) R&D Document Type The record was not marked in the RIV Title Pulsed Laser Deposition under Low Background Gas Pressure. Author(s) Koštejn, Martin (UCHP-M) RID, SAI, ORCID
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Jandová, Věra (UCHP-M) RID, ORCID, SAI
Klementová, Mariana (FZU-D) RID, ORCID
Bakardjieva, Snejana (UACH-T) SAI, RID, ORCIDArticle number LP-O-5 Source Title Programme. Book of Abstracts. - Prague : Czech Chemical Society, 2019 - ISBN N Number of pages 1 s. Publication form Medium - C Action International Conference on Advanced Laser Technologies ALT’19 /27./ Event date 15.09.2019 - 20.09.2019 VEvent location Prague Country CZ - Czech Republic Event type EUR Language eng - English Country CZ - Czech Republic Keywords laser deposition ; gas pressure ; nanoparticles Subject RIV CF - Physical ; Theoretical Chemistry OECD category Physical chemistry Subject RIV - cooperation Institute of Physics - Physical ; Theoretical Chemistry
Institute of Inorganic Chemistry - Inorganic ChemistryInstitutional support UCHP-M - RVO:67985858 ; FZU-D - RVO:68378271 ; UACH-T - RVO:61388980 Annotation The nucleation of nanoparticles was applied during gold deposition onto TiO2 layers. For nucleation, up to 10 Pa of inert gas (argon) was used. Argon molecules efficiently helped to cool temperature of evolving plume and initiated the nucleation which resulted in deposition of gold nanoislands. Gold nanoparticles incorporated in TiO2 layers provided plasmonic properties. Au/TiO2 layers were used for water splitting as proved by photoelectrochemical measurements. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2020
Number of the records: 1