Number of the records: 1

Pulsed Laser Deposition under Low Background Gas Pressure.

SYSNO ASEP	0508744
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	The record was not marked in the RIV
Title	Pulsed Laser Deposition under Low Background Gas Pressure.
Author(s)	Koštejn, Martin (UCHP-M)_{RID, SAI, ORCID} Fajgar, Radek (UCHP-M)_{RID, ORCID, SAI} Dřínek, Vladislav (UCHP-M)_{RID, ORCID, SAI} Jandová, Věra (UCHP-M)_{RID, ORCID, SAI} Klementová, Mariana (FZU-D)_{RID, ORCID} Bakardjieva, Snejana (UACH-T)_{SAI, RID, ORCID}
Article number	LP-O-5
Source Title	Programme. Book of Abstracts. - Prague : Czech Chemical Society, 2019 - ISBN N
Number of pages	1 s.
Publication form	Medium - C
Action	International Conference on Advanced Laser Technologies ALT’19 /27./
Event date	15.09.2019 - 20.09.2019
VEvent location	Prague
Country	CZ - Czech Republic
Event type	EUR
Language	eng - English
Country	CZ - Czech Republic
Keywords	laser deposition ; gas pressure ; nanoparticles
Subject RIV	CF - Physical ; Theoretical Chemistry
OECD category	Physical chemistry
Subject RIV - cooperation	Institute of Physics - Physical ; Theoretical Chemistry Institute of Inorganic Chemistry - Inorganic Chemistry
Institutional support	UCHP-M - RVO:67985858 ; FZU-D - RVO:68378271 ; UACH-T - RVO:61388980
Annotation	The nucleation of nanoparticles was applied during gold deposition onto TiO2 layers. For nucleation, up to 10 Pa of inert gas (argon) was used. Argon molecules efficiently helped to cool temperature of evolving plume and initiated the nucleation which resulted in deposition of gold nanoislands. Gold nanoparticles incorporated in TiO2 layers provided plasmonic properties. Au/TiO2 layers were used for water splitting as proved by photoelectrochemical measurements.
Workplace	Institute of Chemical Process Fundamentals
Contact	Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
Year of Publishing	2020

Number of the records: 1