Number of the records: 1
Recovery of Waste Semiconductors for CVD Precursors.
- 1.
SYSNO ASEP 0499651 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Recovery of Waste Semiconductors for CVD Precursors. Author(s) Bumba, Jakub (UCHP-M) SAI
Dytrych, Pavel (UCHP-M) RID, ORCID, SAI
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Dřínek, Vladislav (UCHP-M) RID, ORCID, SAISource Title Proceedings of the 6th International Conference on Chemical Technology. - Prague : Czech Society of Industrial Chemistry, 2018 / Veselý M. ; Hrdlička Z. ; Hanika J. ; Lubojacký J. - ISSN 2336-8128 - ISBN 978-80-86238-77-7 Pages s. 427-431 Number of pages 5 s. Publication form Online - E Action International Conference on Chemical Technology /6./ Event date 16.04.2018 - 18.04.2018 VEvent location Mikulov Country CZ - Czech Republic Event type EUR Language eng - English Country CZ - Czech Republic Keywords semiconductor industry ; waste photovoltaic panels ; sythesis Subject RIV CI - Industrial Chemistry, Chemical Engineering OECD category Chemical process engineering R&D Projects GA15-14228S GA ČR - Czech Science Foundation (CSF) Institutional support UCHP-M - RVO:67985858 UT WOS 000461293800079 Annotation The newly patented method for regeneration of ultrapure silicon and germanium via magnesium silicide and magnesium germanide from waste photovoltaic (PV) cells, broken germanium lenses and waste magnesium chips was utilized to obtain chemical vapour deposition (CVD) precursors for application in electronics, optics or nanoparticles synthesis. Magnesium silicide and germanide were prepared directly by thermal synthesis from waste materials in optimized tube reactor at 400°C and 5 Pa. X-Ray Diffraction (XRD) confirmed 97.9% respective 95% purity of products. The presence of silicon and germanium hydrides (CVD precursors) prepared by acid hydrolysis in the second step of the process was verified by Gas Chromatography–Mass Spectroscopy (GC/MS) and Fourier Transform Infrared Spectroscopy (FTIR). The crude, unrefined mixture of silicon hydrides served as raw material for CVD experiment at different substrates. SEM images confirmed occurrence of various micro and nano particles which could be used in electronics, optics and catalysis. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2019
Number of the records: 1