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Thin nitride layers as permeation barriers
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SYSNO ASEP 0498179 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Thin nitride layers as permeation barriers Author(s) Veverka, Jakub (UFP-V) ORCID
Matějíček, Jiří (UFP-V) RID, ORCID
Lukáč, František (UFP-V) ORCID
Pospíšil, D. (CZ)
Cvrček, L. (CZ)
Nemanič, V. (SI)Number of authors 6 Source Title Acta Polytechnica CTU Proceedings. - Praha : České vysoké učení technické v Praze, 2018 / Koubský Tomáš - ISSN 2336-5382 - ISBN 978-80-01-06459-7 Pages s. 24-29 Number of pages 6 s. Publication form Online - E Action Sedmá studentská vědecká konference fyziky pevných látek a materiálů Event date 18.09.2018 - 22.09.2018 VEvent location Sedliště u Nepomuku Country CZ - Czech Republic Event type CST Language eng - English Country CZ - Czech Republic Keywords Permeation barriers ; Nitride layers ; PVD coating ; Permeation measurement Subject RIV JK - Corrosion ; Surface Treatment of Materials OECD category Coating and films R&D Projects GA14-12837S GA ČR - Czech Science Foundation (CSF) Institutional support UFP-V - RVO:61389021 Annotation Permeation barriers represent one of the crucial fields in materials development for thermonuclear fusion. Primary objective of the barriers is to suppress the permeation of hydrogen isotopes (mainly tritium) from future thermonuclear fusion facilities. Secondary objective is to reduce their retention in structural materials. Expected reactor conditions put high demands on the material, as well as on the final barrier quality. Key properties are tritium permeation reduction, absence of defects (especially cracks), high-temperature stability and corrossion resistance, and compatibility with structural materials (mostly ferritic-martensitic steels). Thin nitride layers, identified as promising permeation barriers, were prepared by diffusion-based nitridation and physical vapour deposition (PVD), and characterized. Workplace Institute of Plasma Physics Contact Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975 Year of Publishing 2019 Electronic address https://ojs.cvut.cz/ojs/index.php/APP/issue/view/641
Number of the records: 1