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Hydroxylation and self-assembly of colloidal hydrogenated nanodiamonds by aqueous oxygen radicals from atmospheric pressure plasma jet
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SYSNO ASEP 0497855 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Hydroxylation and self-assembly of colloidal hydrogenated nanodiamonds by aqueous oxygen radicals from atmospheric pressure plasma jet Author(s) Jirásek, Vít (UFP-V)
Stehlík, Š. (CZ)
Štenclová, P. (CZ)
Artemenko, A. (CZ)
Rezek, B. (CZ)
Kromka, A. (CZ)Number of authors 6 Source Title RSC Advances. - : Royal Society of Chemistry
Roč. 8, č. 66 (2018), s. 37681-37692Number of pages 12 s. Language eng - English Country GB - United Kingdom Keywords surface-barrier discharge ; diamond nanoparticles ; detonation nanodiamonds ; water ; ftir ; purification ; reactivity Subject RIV CB - Analytical Chemistry, Separation OECD category Analytical chemistry R&D Projects NV15-33018A GA MZd - Ministry of Health (MZ) GJ18-11711Y GA ČR - Czech Science Foundation (CSF) Institutional support UFP-V - RVO:61389021 UT WOS 000450902700014 EID SCOPUS 85056896012 DOI 10.1039/c8ra07873d Annotation Plasma chemical surface modification of nanoparticles in gas-liquid type reactors enables a controllable, specific, low-cost, and environmentally friendly alternative to wet chemistry methods or thermal and dry plasma treatments. Here the atmospheric pressure radio-frequency microplasma jet (mu-APPJ) operating with 0.6% O-2 in He is used to deliver aqueous oxygen radicals (AOR) to the surface of similar to 3 nm hydrogenated detonation nanodiamonds (H-DNDs) suspended in water. The AOR-treated H-DND samples are characterized by FTIR and XPS spectroscopies and by AFM and SEM imaging. The main chemical reaction mechanism is identified as the abstraction of surface hydrogen atoms by O or OH radicals and a consequent attachment of the OH group, thereby increasing concentration of alcohols, carboxyls, and aldehydes on the DND's surface. FTIR spectra reveal also a structural re-arrangement of the surface water on the AOR-treated H-DNDs. Yet zeta-potential of AOR-treated H-DNDs still remains positive (decreases from +45 mV to +30 mV). The chemical modification gives rise to formation of nanoscale chain-like aggregates when AOR-treated H-DNDs are deposited on Si substrate. Workplace Institute of Plasma Physics Contact Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975 Year of Publishing 2019 Electronic address https://pubs.rsc.org/en/Content/ArticleLanding/2018/RA/C8RA07873D#!divAbstract
Number of the records: 1