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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
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SYSNO ASEP 0489644 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold Author(s) Makhotkin, I.A. (NL)
Sobierajski, R. (PL)
Chalupský, J. (CZ)
Tiedtke, K. (DE)
de Vries, G. (NL)
Stoermer, M. (DE)
Scholze, F. (DE)
Siewert, F. (DE)
van de Kruijs, R.W.E. (NL)
Louis, E. (NL)
Jacyna, I. (PL)
Jurek, M. (PL)
Klinger, D. (PL)
Nittler, L. (PL)
Syryanyy, Y. (PL)
Juha, Libor (UFP-V) ORCID
Hájková, V. (CZ)
Vozda, V. (CZ)
Burian, Tomáš (UFP-V) ORCID
Saksl, K. (SK)
Faatz, B. (DE)
Keitel, B. (DE)
Ploenjes, E. (DE)
Schreiber, S. (DE)
Toleikis, S. (DE)
Loch, R. (DE)
Hermann, M. (DE)
Strobel, S. (DE)
Nienhuys, H.-K. (NL)
Gwalt, G. (DE)
Mey, T. (DE)
Enkisch, H. (DE)Source Title Journal of Synchrotron Radiation. - : Oxford Blackwell - ISSN 0909-0495
Roč. 25, č. 1 (2018), s. 77-84Number of pages 8 s. Publication form Online - E Action Workshop on FEL Photon Diagnostics, Instrumentation and Beamline Design (PhotonDiag2017) Event date 01.05.2017 - 03.05.2017 VEvent location Stanford Country US - United States Event type WRD Language eng - English Country DK - Denmark Keywords free-electron laser induced damage ; EUV optics ; thin films ; FELs Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) R&D Projects GA14-29772S GA ČR - Czech Science Foundation (CSF) LG15013 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UFP-V - RVO:61389021 UT WOS 000418593300013 EID SCOPUS 85038971075 DOI 10.1107/S1600577517017362 Annotation The durability of grazing-and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20 degrees and 10 degrees grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16 degrees off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface. Workplace Institute of Plasma Physics Contact Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975 Year of Publishing 2019
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