Number of the records: 1  

Structural and optical properties of Gd implanted GaN with various crystallographic orientations

  1. 1.
    SYSNO ASEP0479677
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleStructural and optical properties of Gd implanted GaN with various crystallographic orientations
    Author(s) Macková, Anna (UJF-V) RID, ORCID, SAI
    Malinský, Petr (UJF-V) RID, ORCID, SAI
    Jagerová, Adéla (UJF-V) ORCID, SAI
    Sofer, Z. (CZ)
    Klímová, K. (CZ)
    Sedmidubský, D. (CZ)
    Pristovsek, M. (GB)
    Mikulics, M. (DE)
    Lorinčík, Jan (URE-Y)
    Bottger, R. (DE)
    Akhmadaliev, S. (DE)
    Number of authors11
    Source TitleThin Solid Films. - : Elsevier - ISSN 0040-6090
    Roč. 638, SEP (2017), s. 63-72
    Number of pages11 s.
    Publication formPrint - P
    Languageeng - English
    CountryCH - Switzerland
    KeywordsGaN implantation ; RBS channelling ; optical properties of Gd implanted GaN
    Subject RIVBG - Nuclear, Atomic and Molecular Physics, Colliders
    OECD category1.3 Physical sciences
    Subject RIV - cooperationInstitute of Radio Engineering and Electronics - Optics, Masers, Lasers
    R&D ProjectsGA13-20507S GA ČR - Czech Science Foundation (CSF)
    GA15-01602S GA ČR - Czech Science Foundation (CSF)
    LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportURE-Y - RVO:67985882 ; UJF-V - RVO:61389005
    UT WOS000411775900009
    EID SCOPUS85025099941
    DOI10.1016/j.tsf.2017.07.036
    AnnotationStructure, morphology, and optical properties of Gd implanted GaN epitaxial layers were studied for (0001), (11-20), and (11-22) orientations. The GaN layers grown by MOVPE on sapphire were subsequently implanted with 200 keV Gd+ ions using fluences of 5 x 10(15) and 5 x 10(16) cm(-2). Dopant depth profiling was accomplished by Rutherford Back-Scattering spectrometry (RBS). Structural and optical changes during subsequent annealing were characterized by RBS, Raman spectroscopy, and photoluminescence measurements. Post-implantation annealing induced a structural reorganization of GaN structure in the buried layer depending on the introduced disorder level, i.e. depending on the implantation fluence and on crystallographic orientation. The defect density depth distribution was evaluated by RBS. The surface morphology and optical properties depend on particular crystallographic orientation.
    WorkplaceNuclear Physics Institute
    ContactMarkéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228
    Year of Publishing2018
Number of the records: 1  

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