Number of the records: 1  

Treatment of surfaces with low-energy electrons

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    SYSNO ASEP0474781
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleTreatment of surfaces with low-energy electrons
    Author(s) Frank, Luděk (UPT-D) RID, SAI, ORCID
    Mikmeková, Eliška (UPT-D) RID
    Lejeune, M. (FR)
    Number of authors3
    Source TitleApplied Surface Science. - : Elsevier - ISSN 0169-4332
    Roč. 407, JUN 15 (2017), s. 105-108
    Number of pages4 s.
    Publication formPrint - P
    Languageeng - English
    CountryNL - Netherlands
    KeywordsLow-energy electrons ; Electron beam induced release ; Graphene ; Ultimate cleaning of surfaces
    Subject RIVJA - Electronics ; Optoelectronics, Electrical Engineering
    OECD categoryNano-processes (applications on nano-scale)
    R&D ProjectsTE01020118 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
    LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportUPT-D - RVO:68081731
    UT WOS000399507700014
    EID SCOPUS85014012530
    DOI10.1016/j.apsusc.2017.02.131
    AnnotationElectron-beam-induced deposition of various materials from suitable precursors has represented an established branch of nanotechnology for more than a decade. A specific alternative is carbon deposition on the basis of hydrocarbons as precursors that has been applied to grow various nanostructures including masks for subsequent technological steps. Our area of study was unintentional electron-beam-induced carbon deposition from spontaneously adsorbed hydrocarbon molecules. This process traditionally constitutes a challenge for scanning electron microscopy practice preventing one from performing any true surface studies outside an ultrahigh vacuum and without in-situ cleaning of samples, and also jeopardising other electron-optical devices such as electron beam lithographs. Here we show that when reducing the energy of irradiating electrons sufficiently, the e-beam-induced deposition can be converted to e-beam-induced release causing desorption of hydrocarbons and ultimate cleaning of surfaces in both an ultrahigh and a standard high vacuum. Using series of experiments with graphene samples, we demonstrate fundamental features of e-beam-induced desorption and present results of checks for possible radiation damage using Raman spectroscopy that led to optimisation of the electron energy for damage-free cleaning. The method of preventing carbon contamination described here paves the way for greatly enhanced surface sensitivity of imaging and substantially reduced demands on vacuum systems for nanotechnological applications.
    WorkplaceInstitute of Scientific Instruments
    ContactMartina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
    Year of Publishing2018
Number of the records: 1  

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