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Nanopatterning of Silicon Nitride Membranes
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SYSNO ASEP 0464387 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Nanopatterning of Silicon Nitride Membranes Author(s) Matějka, Milan (UPT-D) RID, ORCID, SAI
Krátký, Stanislav (UPT-D) RID, ORCID, SAI
Řiháček, Tomáš (UPT-D) RID, ORCID
Kolařík, Vladimír (UPT-D) RID, ORCID, SAI
Chlumská, Jana (UPT-D) RID, ORCID, SAI
Urbánek, Michal (UPT-D) RIDNumber of authors 6 Source Title NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings. - Ostrava : Tanger, 2017 - ISBN 978-80-87294-71-0 Pages s. 709-714 Number of pages 6 s. Publication form Print - P Action NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./ Event date 19.10.2016 - 21.10.2016 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords e-beam writer ; silicon nitride membranes ; nano patterning ; anisotropic etching Subject RIV BH - Optics, Masers, Lasers OECD category Nano-processes (applications on nano-scale) R&D Projects TE01020233 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UPT-D - RVO:68081731 UT WOS 000410656100123 EID SCOPUS 85017261626 Annotation Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The principle of silicon nitride membranes preparation is based on the wet anisotropic etching of the bottom side of the silicon wafer with crystallographic orientation (100). While the basic procedure for the preparation of such membranes is well known, the nano patterning of thin membranes presents quite important challenges. This is partially due to the mechanical stress which is typically presented within such membranes. The resolution requirements of the membrane patterning have gradually increased. Advanced lithographic techniques and etching procedures had to be developed. This paper summarizes theoretical aspects, technological issues and achieved results. The application potential of silicon nitride membranes as a base for multifunctional micro system (MMS) is also
discussed.Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2018
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