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On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

SYSNO ASEP	0449337
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
Author(s)	Kment, Š. (CZ) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Krysa, C. (CZ) Sekora, D. (US) Zlámal, M. (CZ) Olejníček, Jiří (FZU-D)_{RID, ORCID} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Kšírová, Petra (FZU-D)_{RID, ORCID} Remeš, Zdeněk (FZU-D)_{RID, ORCID} Schmuki, P. (DE) Schubert, E. (US) Zbořil, R. (CZ)
Source Title	Applied Catalysis B - Environmental. - : Elsevier - ISSN 0926-3373 Roč. 165, Apr (2015), s. 344-350
Number of pages	7 s.
Language	eng - English
Country	NL - Netherlands
Keywords	ALD ; HiPIMS ; passivation layer ; photoelectrochemical water splitting ; very thin films
Subject RIV	BL - Plasma and Gas Discharge Physics
R&D Projects	GAP108/12/2104 GA ČR - Czech Science Foundation (CSF)
	LH12043 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	FZU-D - RVO:68378271
UT WOS	000347584200038
EID SCOPUS	84908627727
DOI	10.1016/j.apcatb.2014.10.015
Annotation	Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2016

Number of the records: 1