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Reactive Laser-induced Ablation as Approach to Titanium Oxycarbide Films
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SYSNO ASEP 0447486 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Reactive Laser-induced Ablation as Approach to Titanium Oxycarbide Films Author(s) Jandová, Věra (UCHP-M) RID, ORCID, SAI
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Dytrych, Pavel (UCHP-M) RID, ORCID, SAI
Koštejn, Martin (UCHP-M) RID, SAI, ORCID
Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Kupčík, Jaroslav (UCHP-M) RID, ORCID, SAISource Title Thin Solid Films. - : Elsevier - ISSN 0040-6090
Roč. 590, SEP 1 (2015), s. 270-275Number of pages 6 s. Language eng - English Country CH - Switzerland Keywords IR laser ; reactive ablation ; titanium ethoxide Subject RIV CF - Physical ; Theoretical Chemistry Institutional support UCHP-M - RVO:67985858 UT WOS 000361057100041 EID SCOPUS 84941339720 DOI 10.1016/j.tsf.2015.07.052 Annotation The IR laser-induced reactive ablation of frozen titanium ethoxide target was studied. The method involves the laser ablation of titanium ethoxide at −140 °C in gaseous methane (4–50 Pa) atmosphere. This process leads to reactions of the ablative species with hydrocarbon in the gaseous phase. During the ablation of the frozen target excited species interact with methane molecules. The reactive ablation process leads to the formation of a smooth thin film. The thickness of prepared films depends on the number of IR pulses and their composition depends on the pressure of gaseous methane. This reactive IR ablation proceeds as a carbidation process providing nanostructured films with good adhesion to various substrates (glass, metals, KBr) depending on the carbon content in prepared films. Particles are also stabilized by layer preventing their surface oxidation in the atmosphere. The described results are important in the general context for the synthesis of reactive particles in the gas phase. The final products are characterized by spectroscopic, microscopic and diffraction techniques: SEM/EDX, HRTEM, electron diffraction, Raman spectroscopy and XPS. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2016
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