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Interferences and Thermodynamic Limits for Producer Gas Desulfurization, de-HCL and de-HF by Ba, Ce and La-based Sorbents
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SYSNO ASEP 0444793 Document Type O - Others R&D Document Type Others Title Interferences and Thermodynamic Limits for Producer Gas Desulfurization, de-HCL and de-HF by Ba, Ce and La-based Sorbents Author(s) Svoboda, Karel (UCHP-M) RID, ORCID, SAI
Brynda, Jiří (UCHP-M) RID, ORCID, SAI
Hartman, Miloslav (UCHP-M) RID, ORCID, SAI
Chyou, Y.P. (TW)
Pohořelý, Michael (UCHP-M) RID, ORCID, SAI
Skoblia, S. (CZ)
Šyc, Michal (UCHP-M) RID, SAI, ORCID
Kameníková, Petra (UCHP-M) RID, SAIYear of issue 2015 Language eng - English Country SK - Slovakia Keywords gasification ; producer gas ; desulfurization Subject RIV CI - Industrial Chemistry, Chemical Engineering R&D Projects GC14-09692J GA ČR - Czech Science Foundation (CSF) Institutional support UCHP-M - RVO:67985858 Annotation We have focused in our study on thermodynamic analyses of gas desulfurization process (removal of H2S) by selected solid sorbents (BaO/BaCO3, CexOy , La2O3) and comparison with ZnO-based sorbents. In the case of hydrogen-halides we have studied sorption thermodynamics, equilibria and interferences in H2S sorption by BaO/BaCO3, Ce, La and ZnO-based sorbents caused by presence of HCl and HF in the gas. The results indicate that the best sorbent for sulfur compounds at temperatures between 800 K and 1000 K is La2O3. Efficiency of CexOy based sorbents is sensitive to reduction conditions, and temperature. The promising Ba-based sorbents are dependent on appropriate solid solution form stabilizing BaO for its sorption applications. The La2O3 and CexOy based sorbents suffer from significant interferences caused by higher concentrations of HCl and HF in gas at temperatures below approx.. 900 K. The upstream deep removal of HCl (HF) from producer gas by alkaline/alkaline earth-based sorbents in any case contributes to a more efficient and selective downstream sorption of sulfur compounds by the CexOy and La2O3 based sorbents. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2016 Electronic address http://hdl.handle.net/11104/0247271
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