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Deposition of carbon nanostructures by surfatron generated discharge
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SYSNO ASEP 0440056 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve SCOPUS Title Deposition of carbon nanostructures by surfatron generated discharge Author(s) Davydova, Marina (FZU-D) RID, ORCID
Šmíd, Jiří (FZU-D)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Kromka, Alexander (FZU-D) RID, ORCID, SAISource Title Acta Polytechnica. - : České vysoké učení technické - ISSN 1210-2709
Roč. 54, č. 6 (2014), s. 389-393Number of pages 5 s. Language eng - English Country CZ - Czech Republic Keywords carbon nanostructures ; microwave plasma ; PECVD ; surfatron Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects TA01011740 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) GP14-06054P GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 EID SCOPUS 84920277225 DOI 10.14311/AP.2014.54.0389 Annotation Various carbon nanostructures were deposited by surface wave discharge from an Ar/CH4/CO2 gas mixture. The type and the form of the carbon nanostructure were controlled by the gas mixture and the gas inlet. The nanostructures that formed were investigated by scanning electron microscopy and by Raman measurements. The influence of the geometrical combination of the gas inlets (via surfatrons or via the gas shower system) into the chamber is found to be a crucial deposition parameter for the controllable growth of desired carbon nanostructures. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2015
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