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Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning
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SYSNO ASEP 0437840 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning Author(s) Meluzín, Petr (UPT-D) RID, ORCID, SAI
Horáček, Miroslav (UPT-D) RID, ORCID, SAI
Urbánek, Michal (UPT-D) RID
Bok, Jan (UPT-D) RID
Krátký, Stanislav (UPT-D) RID, ORCID, SAI
Matějka, Milan (UPT-D) RID, ORCID, SAI
Chlumská, Jana (UPT-D) RID, ORCID, SAI
Kolařík, Vladimír (UPT-D) RID, ORCID, SAINumber of authors 8 Source Title NANOCON 2014. 6th International conference proceedings. - Ostrava : TANGER, 2014 - ISBN 978-80-87294-55-0 Number of pages 6 s. Publication form Medium - C Action NANOCON 2014. International Conference /6./ Event date 05.11.2014-07.11.2014 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords e-beam writer ; optical nano structures ; diffraction gratings ; fractal gratings Subject RIV BH - Optics, Masers, Lasers R&D Projects LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UPT-D - RVO:68081731 UT WOS 000350636300041 Annotation E-beam lithography is a flexible technology for diffraction gratings origination. Nevertheless, requirements of the high optical quality of large area diffractive structures imply various severe challenges to e-beam delineating processes. This paper summarizes the e-beam process parameters that influence the quality of large area grating structures. Next, we propose some new methods to prepare diffraction gratings that were found to be useful for testing and benchmarking purposes. Those methods include single line gratings, labyrinth structures, fractional structures, tiling patterns, quasi regular filling structures and forked line structures. Various samples were prepared with the standard and newly developed e-beam patterning processes using both e-beam writers available: one with the Gaussian beam at 100 keV and another one with the shaped beam at 15 keV. Some of the results are presented further in this paper, their variants and parameters are discussed as well as their usefulness as benchmarking e-beam patterns for large area optical structures, elements and devices. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2015
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