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Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam

SYSNO ASEP	0437838
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	Conference Paper
Title	Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam
Author(s)	Horáček, Miroslav (UPT-D)_{RID, ORCID, SAI} Krátký, Stanislav (UPT-D)_{RID, ORCID, SAI} Urbánek, Michal (UPT-D)_RID Kolařík, Vladimír (UPT-D)_{RID, ORCID, SAI} Meluzín, Petr (UPT-D)_{RID, ORCID, SAI} Matějka, Milan (UPT-D)_{RID, ORCID, SAI} Chlumská, Jana (UPT-D)_{RID, ORCID, SAI}
Number of authors	7
Source Title	NANOCON 2014. 6th International conference proceedings. - Ostrava : TANGER, 2014 - ISBN 978-80-87294-55-0
Number of pages	5 s.
Publication form	Medium - C
Action	NANOCON 2014. International Conference /6./
Event date	05.11.2014-07.11.2014
VEvent location	Brno
Country	CZ - Czech Republic
Event type	WRD
Language	eng - English
Country	CZ - Czech Republic
Keywords	e-beam writer ; Gaussian beam ; variable shaped beam
Subject RIV	JA - Electronics ; Optoelectronics, Electrical Engineering
R&D Projects	LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	TE01020118 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
Institutional support	UPT-D - RVO:68081731
UT WOS	000350636300042
Annotation	One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase exposures throughput.
Workplace	Institute of Scientific Instruments
Contact	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Year of Publishing	2015

Number of the records: 1