Number of the records: 1
High-rate reactive deposition of transparent SiO.sub.2./sub. films containing low amount of Zr from molten magnetron target
- 1.
SYSNO ASEP 0437497 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target Author(s) Musil, Jindřich (FZU-D) RID, ORCID
Satava, V. (CZ)
Baroch, P. (CZ)Source Title Thin Solid Films. - : Elsevier - ISSN 0040-6090
Roč. 519, č. 2 (2010), s. 775-777Number of pages 3 s. Language eng - English Country CH - Switzerland Keywords sputtering ; evaporation ; reactive deposition ; target power density Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z10100520 - FZU-D (2005-2011) UT WOS 000284499500039 EID SCOPUS 77958493833 DOI 10.1016/j.tsf.2010.09.009 Annotation The paper reports on a reactive deposition of transparent SiO2 films with a low amount (<= 3 at.%) of Zr prepared from the molten target using the AC pulsed dual magnetron It is shown that the deposition rate a(D) of the transparent oxide film strongly increases at the critical target power density (W-t)(cr) when the solid target starts to melt and the magnetron operates with a molten target. In this case the evaporation of target material plays a dominant role in the reactive deposition of thin films This process is called the ionized magnetron evaporation Oxide films reactively deposited from the molten target are well transparent and highly elastic The maximum deposition rate of the transparent oxide film achieved in our experiments is 814 nm/min. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2015
Number of the records: 1