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Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
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SYSNO ASEP 0432632 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching Author(s) Domonkos, Mária (FZU-D) RID
Ižák, Tibor (FZU-D) RID
Babchenko, Oleg (FZU-D) RID, ORCID
Varga, Marián (FZU-D) RID, ORCID
Hruška, Karel (FZU-D) RID, ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAISource Title Advanced Science, Engineering and Medicine - ISSN 2164-6627
Roč. 6, č. 7 (2014), s. 780-784Number of pages 5 s. Language eng - English Country US - United States Keywords micro- and nanocrystalline diamond ; capacitively coupled plasma ; reactive ion etching ; nanostructuring ; scanning electron microscopy Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GAP108/12/0910 GA ČR - Czech Science Foundation (CSF) GAP108/12/0996 GA ČR - Czech Science Foundation (CSF) FR-TI2/736 GA MPO - Ministry of Industry and Trade (MPO) Institutional support FZU-D - RVO:68378271 DOI 10.1166/asem.2014.1573 Annotation In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2015
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