Number of the records: 1  

Reactive ion etching of polystyrene microspheres

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    SYSNO ASEP0425611
    Document TypeK - Proceedings Paper (Czech conf.)
    R&D Document TypeConference Paper
    TitleReactive ion etching of polystyrene microspheres
    Author(s) Domonkos, Mária (FZU-D) RID
    Ižák, Tibor (FZU-D) RID
    Štolcová, L. (CZ)
    Proška, J. (CZ)
    Kromka, Alexander (FZU-D) RID, ORCID, SAI
    Source TitleNanomateriály a nanotechnologie ve stavebnictví 2013. - Praha : ČVUT, 2013 / Nežerka V. ; Rácová Z. ; Ryparová P. ; Tesárek P. - ISBN 978-80-01-05334-8
    S. 24-28
    Number of pages5 s.
    Publication formOnline - E
    ActionNanomateriály a nanotechnologie ve stavebnictví 2013
    Event date12.06.2013-12.06.2013
    VEvent locationPraha
    CountryCZ - Czech Republic
    Event typeCST
    Languageeng - English
    CountryCZ - Czech Republic
    Keywordsnanosphere lithography ; reactive ion etching ; polystyrene microspheres ; Langmuir-Blodgett monolayers
    Subject RIVBL - Plasma and Gas Discharge Physics
    R&D ProjectsGBP108/12/G108 GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    AnnotationThis article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2014
Number of the records: 1  

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