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Linear antenna microwave surface wave plasma characterization by Langmuir probe
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SYSNO ASEP 0424648 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Linear antenna microwave surface wave plasma characterization by Langmuir probe Author(s) Potocký, Štěpán (FZU-D) RID, ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Babchenko, Oleg (FZU-D) RID, ORCID
Ižák, Tibor (FZU-D) RID
Kromka, Alexander (FZU-D) RID, ORCID, SAISource Title 4 IC4N (International conference nanoparticles and nanomaterials to nanodevices and nanosystems /4./) Book of Abstracs. - Arlington : University of Texas, 2013 / Meletis E.I. ; Kanellopoulos N. ; Politis C. ; Schommers W.
S. 132-132Number of pages 1 s. Action IC4N 2013 International conference from nanoparticles and nanomaterials to nanodevices and nanosystems /4./ Event date 16.06.2013-20.06.2013 VEvent location Corfu Country GR - Greece Event type WRD Language eng - English Country US - United States Keywords Langmuir probe ; nanocrystalline diamond ; plasma enhanced CVD ; Raman spectroscopy ; SEM Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects TA01011740 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LM2011026 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GAP205/12/0908 GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 Annotation In the presented work we analyze a MW-SW plasma assisted CVD process during growth of different carbon forms. Spatially and time resolved Langmuir probe measurements were done to calculate plasma temperature, density of species, plasma potentials, etc. Due to a pulse modulation of MW generator measurements were done in the middle of the pulse (at 3 µs). At each of four different distances between antenna and substrate process parameters were varied according to diamond film transformation i) from poly- to nano-crystalline character, ii) from solid layer to porous structure, and iii) from lower to higher deposition speed. Significant influence by plasma temperature and density, especially for process pressures lower than 50 Pa was observed. A complex correlation between process parameters, plasma characteristics and the deposit is studied and used for explanation of different growth regimes. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2014
Number of the records: 1