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Perspectives in diamond thin film technology
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SYSNO ASEP 0398413 Document Type K - Proceedings Paper (Czech conf.) R&D Document Type The record was not marked in the RIV Title Perspectives in diamond thin film technology Author(s) Kromka, Alexander (FZU-D) RID, ORCID, SAI Number of authors 1 Source Title Proceedings of the 3rd Winter Education Seminar in Rokytnice nad Jizerou 2012. - Praha : FZÚ AV ČR, v.v.i, 2012 / Hoďáková L. ; Remeš Z. ; Kromka A. ; Ledinský M. - ISBN 978-80-260-3425-4
S. 50-65Number of pages 11 s. Action Winter Education Seminar /3. / Event date 01.02.2012 -04.02. 2012 VEvent location Rokytnice nad Jizerou Country CZ - Czech Republic Event type CST Language eng - English Country CZ - Czech Republic Keywords nanocrystalline diamond ; nucleation of NCD ; growth of NCD ; MW-PECVD Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GBP108/12/G108 GA ČR - Czech Science Foundation (CSF) IAAX00100902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) Institutional support FZU-D - RVO:68378271 Annotation Synthetic diamond thin films are routinely grown over world not only for basic research but also for industrial uses. At the Institute of Physics (IoP), diamond thin films are grown since 2002. The first installed deposition system is base on microwave plasma enhanced chemical vapor deposition (CVD) in hydrogen reach gas mixture (<2% methane diluted in hydrogen). This system is well suitable for fast growth of high quality diamond films up to 5 cm in diameter. The main advance of the system is cavity like resonator which allows running stable CVD process for several days at relatively high pressures (>200 mbar). Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2014
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