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The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil

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    SYSNO ASEP0390196
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleThe Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil
    Author(s) Morozová, Magdalena (UCHP-M) RID, SAI
    Klusoň, Petr (UCHP-M) RID, ORCID, SAI
    Dzik, P. (CZ)
    Veselý, M. (CZ)
    Baudyš, M. (CZ)
    Krýsa, J. (CZ)
    Šolcová, Olga (UCHP-M) RID, ORCID, SAI
    Source TitleJournal of Sol-Gel Science and Technology. - : Springer - ISSN 0928-0707
    Roč. 65, č. 3 (2013), s. 452-458
    Number of pages7 s.
    Languageeng - English
    CountryUS - United States
    Keywordstitanium dioxide ; photoelectrochemical properties ; deposition techniques
    Subject RIVCI - Industrial Chemistry, Chemical Engineering
    R&D ProjectsTA01020804 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
    Institutional supportUCHP-M - RVO:67985858
    UT WOS000315628200022
    DOI10.1007/s10971-012-2957-6
    AnnotationThin sol-gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as electrochemical cell. The thin TiO2 films were treated at 450° C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV-Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation.
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2013
Number of the records: 1  

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