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Structuring of diamond films by reactive ion plasma etching

SYSNO ASEP	0389420
Document Type	K - Proceedings Paper (Czech conf.)
R&D Document Type	Conference Paper
Title	Structuring of diamond films by reactive ion plasma etching
Author(s)	Domonkos, M. (CZ) Ižák, Tibor (FZU-D)_RID Proška, J. (CZ) Kromka, Alexander (FZU-D)_{RID, ORCID, SAI}
Source Title	Nanomateriály a nanotechnologie ve stavebnictví 2012 (NaNS 2012). - Praha : ČVUT, 2012 / Rácová Z. ; Tesárek P. ; Nežerka V. ; Ryparová P. - ISBN 978-80-01-05132-0 S. 35-40
Number of pages	6 s.
Publication form	Print - P
Action	Nanomateriály a nanotechnologie ve stavebnictví 2012 (NaNS 2012)
Event date	11.09.2012-11.09.2012
VEvent location	Praha
Country	CZ - Czech Republic
Event type	CST
Language	eng - English
Country	CZ - Czech Republic
Keywords	nanostructuring ; diamond thin films ; reactive ion etching ; scanning electron microscopy
Subject RIV	BM - Solid Matter Physics ; Magnetism
R&D Projects	GAP108/12/0910 GA ČR - Czech Science Foundation (CSF)
	GAP108/11/0794 GA ČR - Czech Science Foundation (CSF)
	IAAX00100902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
CEZ	AV0Z10100521 - FZU-D (2005-2011)
Annotation	In this study, two common strategies of diamond film structuring are described. Main focus is on the comparison of top-down and the bottom-up strategies. The top-down strategy is primary related to dry reactive ion etching through masking materials (or even without mask), while bottom-up strategy is based on selective area deposition of diamond film. Several methods of both strategies are demonstrated in details in the article, regarding to their properties and basic principles.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2013

Number of the records: 1